Crystallite orientation and lateral material distribution in transition metal dichalcogenide thin films studied by laboratory GIWAXS

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By Karol Végsö, Slovak Academy, Lenka Pribusová Slušná
| Wiley Online Library
The chemical vapor deposition (CVD) technique is widely used to prepare transition metal dichalcogenide (TMD) thin films. Parameters such as precursors, type of substrate, temperature profile, gas flow through the CVD chamber and pressure can influence the orientation of TMD crystals in a thin film.
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