Supporting Information Filename Description cjoc202500041-sup-0001-supinfo.pdfPDF document, 3.1 MB Appendix S1: Supporting Information References 1 ; ; ; ; ; Extreme ultraviolet resist materials for sub-7 nm patterning. Chem. Soc. Rev. 2017, 46, 4855–4866. 2 Fifty Years of Moore's Law. Proc. IEEE 2015, 103, 1932–1937. 3 ; ; ; Scalable Fabrication of Metallic Nanogaps at the Sub-10 nm Level. Adv. Sci. 2021, 8, 2102756. 4 Materials challenges for sub-20-nm lithography. J. Micro/Nanolithogr.