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1 Introduction Nanoimprint lithography (NIL) is a prominent method for patterning micro- and nanostructures onto material surfaces to modulate their physicochemical properties [1-3]. Driven by its exceptional resolution, cost-effectiveness, and high throughput, NIL has developed into a cornerstone technique in the fabrication of optical devices [4-6], biosensors [7, 8], and flexible electronics [9, 10].
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