Barbara Stadlober

Abstract A data-driven optimization algorithm is described for maskless grayscale laser lithography (MGLL), providing effective correction for topography errors deriving from the non-linear response of the photoresist to exposure dose, proximity effects and sharp dose transitions near edges and vertices.

1 Introduction Roll-to-roll UV nanoimprint lithography (R2R UV-NIL) provides large area patterning of flexible substrates with nanometer scale resolution. Its applications span a wide field, including realization of security features,[1] nanostructured bionic surfaces,[2, 3] and lab-on-a-chip devices,[4] as well as in microelectronics and optics[5] to name just a few.

Abstract Large-area, flexible proximity-sensing surfaces are useful in a range of applications including process control, work security and robotics. However, current systems typically require rigid and thick electronics, which limit how they can be used. Here we report a flexible large-area proximity-sensing surface fabricated using printed organic materials and incorporating analogue front-end electronics in each pixel.