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Beom Yong Kim

As seen in: Royal Society of Chemistry
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Atomic layer deposition of HfNx films and improving the film performance by annealing under NH3 atmosphere

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By Seung Yong, Seung Yong Byun, Seung Kyu Ryoo, Beom Yong Kim
| Royal Society of Chemistry Verified
Atomic layer deposition of HfNx films and improving the film performance by annealing under NH3 atmosphere† Seung Kyu Ryoo,a Beom Yong Kim,ab Yong Bin Lee,a Hyeon Woo Park,a Suk Hyun Lee,a Minsik Oh,a In Soo Lee,a Seung Yong Byun,a Doo Sup Shim,ab Jae Hoon Lee,ab Ha Ni Kim,ab Kyung Do Kima and Cheol Seong Hwang *a Abstract HfNx films were deposited by atomic layer deposition (ALD) using Hf[N(CH3)(C2H5)]4 (TEMAHf) and NH3 as the Hf-precursor and reactant gas, respectively.
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