1 Introduction 2D transition metal dichalcogenide monolayers (1L-TMDCs) have emerged as promising candidates for next-generation electronic and optoelectronic applications. However, their practical implementation is often hindered by defects introduced during synthesis, exfoliation, and transfer processes [1]. Among these, line defects such as wrinkles, microcracks, and grain boundaries, pose particularly significant challenges owing to their extended spatial influence.