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Chuan Chu Tee

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Articles

Atomically thin amorphous carbon with an ultralow dielectric constant

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By Chee-Tat Toh, Artem K. Grebenko, Usha Bhat, Hongji Zhang, Lu Shi, Alena Alekseeva, Konstantin Iakoubovskii, Denis V. Vyalikh, Anna Makarova, Alexander Fedorov, Lucas M. Sassi, Michel Bosman, Naoto Kamiuchi, Yuta Sato, Ugur Karadeniz, Iurii Rogov, Daria Noskova, Andrei Starkov, Chuan Chu Tee, Kazutomo Suenaga
| Nature Verified
Abstract Two-dimensional (2D) materials could replace conventional electronic components. Key advances have already been made in applying 2D materials to integrated circuits, but a robust, atomically thin ultralow-k dielectric remains crucial for further circuit scaling. Minimizing parasitic capacitances, in particular, will be needed as conductor spacing shrinks below 10 nm. However, conventional amorphous or porous low-k dielectrics become unstable at nanometre thicknesses.
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