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E. Baradács on Muck Rack

E. Baradács

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Ni-interlayer-induced modulation of electrical and dielectric properties in ZnO/Ni/ZnO thin films fabricated using hybrid deposition techniques

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By S. Fouad, M. Nabil, Neeraj Mehta, Hytham A. Abd El-Ghany, E. Baradács, Z. Erdélyi
| Nature Verified
Abstract Interface engineering in oxide multilayers provides a powerful pathway to regulate charge transport and dielectric response in low-dimensional material systems. Here, ZnO/Ni/ZnO (ZNZ) trilayer thin films with fixed ZnO thickness and systematically varied Ni interlayer thickness are fabricated using a hybrid combination of atomic layer deposition (ALD) and direct current magnetron sputtering (DCMS).
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