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Haklim Koo on Muck Rack

Haklim Koo

As seen in: Royal Society of Chemistry
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Articles

Cocktail Precursor Approach for Homogeneous ALD InGaO Film Growth Overcoming Limits of Mobility–Reliability Trade-Off in Oxide Semiconductors

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By Seong-Hwan Ryu, Dong-Gyu Kim, Haklim Koo, Kyuhyun Yeom
| dx.doi.org
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Controlled 2D Growth Approach via Atomic Layer Deposition for Improved Stability and Performance in Flexible SnO Thin-film Transistors

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By Hye-Mi Kim, Won-Bum Lee, Seo-Yeong Kim, Haklim Koo
| Royal Society of Chemistry Verified
Controlled 2D Growth Approach via Atomic Layer Deposition for Improved Stability and Performance in Flexible SnO Thin-film Transistors Tin monoxide (SnO) has been extensively studied due to its promising theoretical p-type performance. However, the fabrication of SnO thin films and SnO channel thin-film transistors (TFTs) faces hurdles that are mainly related to the low thermal and air stability of SnO and high number of defect states in the crystalline structure.
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