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Hyeong Gu Lim

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An Autoencoder-Based Process Control Method for Chemical Mechanical Polishing: Noise Robustness and Control Cost Reduction

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By Jongkwan Choi, Hyeong Gu Lim
| Wiley Online Library Verified
Data Availability Statement The data that support the findings of this study are available from Semiconductor manufacturing company. Restrictions apply to the availability of these data, which were used under license for this study. Data are available from the author(s) with the permission of Semiconductor manufacturing company. References , and . 2001. “Age-Based Double EWMA Controller and Its Application to CMP Processes.” IEEE Transactions on Semiconductor Manufacturing 14: 14–19. , , , , , and .
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