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Articles

Unfolding an Elusive Area-Selective Deposition Process: Atomic Layer Deposition of TiO2 and TiON on SiN vs SiO2

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By Alfredo Mameli, Jie Shen, Fred Roozeboom, Kanda Tapily
| dx.doi.org
RETURN TO ARTICLES ASAPPREVSurfaces, Interfaces...Surfaces, Interfaces, and ApplicationsNEXT , Kanda Tapily TEL Technology Center, America, LLC, Albany, New York 12203, United States , * Jie Shen TNO-Holst Centre, High Tech Campus 31, 5656 AE Eindhoven, The Netherlands *Email: jie.shen@tno.nl , Fred Roozeboom University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands , Mengcheng Lu Intel Corporation, Hillsboro, Oregon 97124-6497, United States , David O’Meara Tokyo Electron America,...
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