Krishna Nama Manjunatha

Graphical Abstract Mist Chemical Vapor Deposition A novel material deposition technique called Mist Chemical Vapor Deposition (M-CVD) is demonstrated in article number 2300296 by Shashi Paul and co-workers. As part of the study presented in this paper, the equipment was developed. Deposition of thin films can be achieved by using environmentally friendly precursors. It may become a universal method to grow thin films or single crystals of different materials in the near future.

1 Introduction The environmental concerns related to the electronics today, both in terms of the materials utilized and synthesis methods, are very worrisome. Most of the current methods of synthesis of functional materials and manufacture of electronic devices require a high temperature that results in an increased carbon footprint.