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Pranavram Venkatram on Muck Rack

Pranavram Venkatram

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Articles

Two-dimensional crystalline hard masks for high-aspect-ratio nanofabrication

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By Ziheng Chen, Krishnendu Mukhopadhyay, Vlastimil Mazanek, Zdenek Sofer, Saptarshi Das Verified, Pranavram Venkatram, Bob Hengstebeck
| Nature Verified
Abstract Hard masks with high etch selectivity are essential for fabricating high-aspect-ratio nanostructures via deep and anisotropic plasma etching. While most two-dimensional materials are susceptible to plasma damage, we report that van der Waals metal oxyhalides, specifically CrOCl and FeOCl, exhibit extraordinary resistance to aggressive SF6/O2 plasma, far surpassing conventional hard mask materials.
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