Yeongchan Choi on Muck Rack

Yeongchan Choi

As seen in: Royal Society of Chemistry
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Articles

Atomic Layer Deposition of Silicon Oxide Films Using Bis(dimethylaminomethylsilyl)trimethylsilylamine and Ozone: First-principle and Experimental Study

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By Yeongchan Choi, Heeju Son, Khabib Khumaini, Hyunmin Han
| Royal Society of Chemistry Verified
Atomic Layer Deposition of Silicon Oxide Films Using Bis(dimethylaminomethylsilyl)trimethylsilylamine and Ozone: First-principle and Experimental Study Yeongchan Choi, Heeju Son, Khabib Khumaini, Hyunmin Han, Hyeonsu Roh, Hye-Lee Kim, Sang Ick Lee and Won-Jun Lee Abstract We report the atomic layer deposition (ALD) of silicon oxide films using a chlorine-free silylamine precursor and ozone (O3).
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