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Bartłomiej W. Klus on Muck Rack

Bartłomiej W. Klus

As seen in: Optica
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Articles

Structured alignment layers for nematic liquid crystals: electron-beam lithography as a tool for advanced photonic applications

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By Urszula A. Laudyn, Michał Kwaśny, Bartłomiej W. Klus
| Optica Verified
Nematic liquid crystals (NLCs) enable integrated photonic systems where precise molecular alignment controls optical anisotropy and light guiding. Conventional alignment methods balance anchoring strength, patterning freedom, and scalability with inherent trade-offs. We present polymethyl methacrylate (PMMA) nanogroove alignment layers fabricated by electron-beam lithography (EBL), allowing mask-free, submicron alignment geometries.
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