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Dong Gi Lee on Muck Rack

Dong Gi Lee

As seen in: MDPI, Optica
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Articles

Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types

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By Seungchan Moon, Dong Gi Lee, Jinhyuk Choi, Junho Hong
| MDPI
All articles published by MDPI are made immediately available worldwide under an open access license. No special permission is required to reuse all or part of the article published by MDPI, including figures and tables. For articles published under an open access Creative Common CC BY license, any part of the article may be reused without permission provided that the original article is clearly cited. For more information, please refer to https://www.mdpi.com/openaccess.
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Extreme ultraviolet pellicle wrinkles influence on mask 3D effects: experimental demonstration

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By Seungchan Moon, Jinho Ahn, Jinhyuk Choi, Dong Gi Lee
| Optica Verified
Extreme ultraviolet (EUV) lithography uses reflective optics and a thick mask absorber, leading to mask 3D (M3D) effects. These M3D effects cause disparities in the amplitudes and phases of EUV mask diffractions, impacting mask imaging performance and reducing process yields. Our findings demonstrate that wrinkles in the EUV pellicle can exacerbate M3D effects. This imbalance results in critical dimension variation, image contrast loss, and pattern shift in mask images.
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Investigating the Degradation of EUV Transmittance of an EUV Pellicle Membrane

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By Yong Ju Jang, Dong Gi Lee, Seong Ju Wi, Seon Yong Kim
| MDPI
This is an early access version, the complete PDF, HTML, and XML versions will be available soon.
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