Emmanouil Kechaoglou

Abstract The continuous shrinkage of critical dimensions in nanofabrication demands nanometrology at the relevant resolution, which can be achieved using short-wavelength light sources. Most industrial metrology uses periodic structures for process control, exploiting diffraction to probe the fabrication quality of actual device structures. Here, we introduce a table-top high-harmonic generation extreme-ultraviolet scatterometry with broadband illumination.

Eur. Phys. J. Appl. Phys.

On the study of paintings’ stratigraphy by fs-LIBS and MA-XRF techniques Works of art, especially paintings, often involve successive layers of materials of diverse compositions and properties. The current study explores the potentialities of the combination of femtosecond Laser Induced Breakdown Spectroscopy (fs-LIBS) and Macro X-Ray Fluorescence (MA-XRF) for the study of paintings.