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Hezar Jarib Ave on Muck Rack

Hezar Jarib Ave

As seen in: Optica
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Robust design, fabrication, and characterization of a 1064 nm Ag/Al 2 O 3 metal–dielectric thin-film bandpass filter with an enhanced rejection-band ratio

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By Hamidreza Fallah, Kosar Negarestani, Hezar Jarib Ave
| Optica Verified
This study presents a novel multilayer metal–dielectric (MD) thin-film bandpass filter, to our knowledge, designed to overcome the low rejection-band ratio of conventional all-dielectric filters. By integrating a silver (Ag) layer within a dielectric stack and employing aluminum oxide $(\text{Al}_{2}\text{O}_{3})$ as both a phase-matching and protective layer, the filter achieves an enhanced rejection-band ratio of 3.1:1 while improving adhesion and preventing metal oxidation.
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