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Long-term reliability of naturally aged hafnium oxide ferroelectric transistors for energy-efficient embedded memory
Keywords FeFET hafnium oxide reliability endurance retention memory window interface traps oxide traps charge pumping trap dynamics pulse shaping temperature dependence embedded memory CMOS compatibility Introduction Hafnium oxide (HfO2)-based ferroelectric field-effect transistors (FeFETs) have rapidly emerged as frontrunners in the race for next-generation non-volatile memory (NVM).1,2,3 Their promise stems from a unique combination of attributes: sub-nanosecond polarization switching,4...
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