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Jibin He on Muck Rack

Jibin He

As seen in: Optica
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Articles

Top-profile-prior-constrained inversion for bottom-parameter reconstruction of extreme ultraviolet mask phase defects

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By Jibin He, Microelectronic Equipment, Sikun Li
| Optica Verified
Accurate repair or compensation of buried multilayer phase defects in extreme ultraviolet (EUV) lithography requires reliable knowledge of their three-dimensional morphology, yet the bottom-profile parameters remain difficult to recover from a single aerial-image observation.
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